Aluminum sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)

Aluminum sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)

Germanium n-butoxide, 97+%
Aluminum sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.999% (metals basis)
AA040826-041 CELL CULTURE PLACE PS 12 WELL Size: 5each
Technical
AA040826-372 CELL CULTURE PLACE PS 12 WELL Size: 1each
Technical
Description
Aluminum sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
CAS No
7429-90-5
Specification
Product Details
AA040826-041

Data sheet

Pack Size
1each
CAS No
7429-90-5

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